Murata has announced a new generation silicon capacitor process which builds devices less than 40µm thick and up to 1.3µF/mm2. Made using semiconductor lithography techniques, the capacitors are ...

TOKYO — Toshiba Corp. said it is leveraging its deep-trench-capacitor DRAM structure, which it has championed as a process driver since the 0.25-micron generation, to migrate its system-on-chip ...

Nanomechanical systems developed at TU Wien have now reached a level of precision and miniaturization that will allow them to be used in ultra-high-resolution atomic force microscopes in the future.

But if you eliminate the capacitor, where is the charge that represents the data bit stored? That's the magic of SOI. The active circuit layer is isolated from the substrate, so there's a capacitive ...