Advanced nodes that have been leveraging curvilinear correction with technologies such as ILT and curvilinear OPC are increasingly requiring the use of curvilinear masks to meet advanced feature size ...

The increased photomask write time using a variable-shape e-beam (VSB) writer has been a barrier to the adoption of inverse lithography technology (ILT) beyond the limited usage for hot spots. The ...

Lot’s of people are spiffing up their homes at this time of year, getting ready to make a great impression on people visiting for the end-of-year holidays. Carpets, wallpapers, curtains, upholstery, ...